Atomic force microscopes for industry

Atomic force microscopy (AFM) is emerging as an essential tool for nanoscale analysis and measurement in many industries. The AFM has the ability to accurately measure critical dimensions in the micrometer to nanometer regime. This ability makes the AFM the tool of choice for applications involving surface roughness, trench depth, sidewall slope angle, and line width characterization of various samples features and materials. Now the major industries have adopted the AFM as a tool for critical manufacturing process monitoring.

Park AFM technology
Crosstalk Elimination - flat orthogonal XY scanning without scanner bow
Park's Crosstalk Elimination removes scanner bow, allowing flat orthogonal XY scanning regardless of scan location, scan rate, and scan size. It shows no background curvature even on flattest samples, such as an optical flat, and with various scan offsets. This provides a very accurate height measurement and precision nanometrology for the most challenging problems in research and engineering.

True non-contact mode preserves sharp tip
AFM tips are so brittle that touching a sample will instantly reduce the resolution and quality of the image they produce. For soft and delicate samples, the tip will also damage the sample and result in inaccurate sample height measurements, something that can cost you valuable time and money. True non-contact mode, a scan mode unique to Park AFMs, consistently produces high resolution and accurate data while maintaining the integrity of the sample.
True Sample Topography without piezo creep error
Park AFMs are equipped with the most effective low noise Z detectors in the field, with a noise of 0.02 nm over large bandwidth. This produces highly accurate sample topography, no edge overshoot and no need for calibration. Just one of the many ways Park AFMs saves your time and give you better data.

Park NX-Hivac allows failure analysis engineers to improve the sensitivity of their measurements through high vacuum Scanning Spreading Resistance Microscopy (SSRM). Because high vacuum scanning offers greater accuracy, better repeatability, and less tip and sample damage than ambient or dry N2 conditions, users can measure a wide range of dope concentration and signal response in failure analysis applications.

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The task of identifying nanoscale defects is a very time consuming process for engineers working with media and flat substrates. Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput. In addition, Park NX-HDM provides accurate sub-angstrom surface roughness measurements, scan after scan.

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Park Systems' PTR series is a fully automatic industrial in-line AFM solution for, but not limited to, automatic pole tip recession measurements on rowbar-level, individual slider-level, and HGA-level sliders. With sub-nano scale accuracy, repeatability, and throughput, the PTR Series is the metrology tool of choice for slider manufacturers to improve their overall production yield.

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Park Systems offer the industry’s lowest noise, fully automated industrial AFM, the NX-Wafer.  The completely automated AFM system is designed for high resolution surface roughness, trench width, depth and angle measurements on 200 mm & 300 mm wafers with sub-nanometer precision in a 24/7 production environment. Our true non-contact mode enables non-destructive measurements even on soft structures such as photoresist trench surfaces.

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The revolutionary XE-3DM is a completely automated AFM system designed for overhang profiles, high-resolution sidewall imaging, and critical angle measurements. With the patented decoupled XY and Z scanning system with tilted Z-scanner, it overcomes the challenges of the normal and flare tip methods in accurate sidewall analysis. In utilizing our true non-contact mode, the XE-3DM enables non-destructive measurement of soft photoresist surfaces with high aspect ratio tips.

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Park NX20, with its reputation as the world’s most accurate large sample AFM, is rated highly in the semiconductor and hard disk industry for its data accuracy.

 

 

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Park SmartScan is a revolutionary operating software for Park AFMs that lets even inexperienced, untrained users produce high quality nanoscale imaging through three simple clicks of a mouse in auto mode, which rivals that made by experts using conventional techniques. SmartScan manual mode also provides all of the functions and tools necessary for more seasoned users to feel at home. This combination of extreme versatility, ease-of-use, and quality makes SmartScan the best AFM operating software available.

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